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Editor-in-chief
LIU Yichun
Academician of Chinese Academy of Sciences,
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About the Journal
Chinese Journal of Vacuum Science and Technology (CJVST) is national level scientific journal operated by the Chinese Vacuum Society and approved by the Chinese Association for Science and Technology. CJVST pressed the first volume in 1981. Since then, CJVST has been listed as a Chinese Science Citation Database (CSCD) journal and Chinse Core Journal. CJVST publishes Chinese and English research papers on vacuum acquisition, improvement, testing, and application, involving the intersection of physics, chemistry, engineering, materials, biology and other disciplines.
Cover Aticle
Design of Air-coupled Broadband CMUT Micro-elements and Array Configurations
Secondary Electron Suppression in a Compact ECR-DD Neutron Generator
The Influence of Structural Parameters on the Output Pulse Current Rise Rate of Triggered Vacuum Switch
Analysis of Magnetic Blowing Characteristics and Breakdown Resistance Performance of Vacuum Interrupter Considering Interval Uncertainty
The First-principles Study of Hydrogen Adsorption and Diffusion Processes on Zirconium Surfaces and in Bulk
more..Atomic Layer Etching: Process, Material Compatibility and Advances in Applications
CAO Yong;GAO Yuan;WANG Zhengduo;FAN Xiuwei;LIU Zhongwei;Atomic layer etching(ALE) is a material removal technology with atomic-level precision based on a cyclic "surface modification-etching" process. Owing to the excellent performance including self-limiting monolayer removal, high selectivity, and three-dimensional uniformity, ALE has been extensively applied in semiconductor manufacturing, nanodevice processing, and optoelectronic device development, among other fields.Depending on energy-driven mechanisms, ALE technologies are primarily categorized into thermal atomic layer etching(T-ALE), laser atomic layer etching(L-ALE), ion beam atomic layer etching(IB-ALE) and plasma atomic layer etching(P-ALE). This review summarizes the fundamental principles, process characteristics, and recent advancements of various ALE technologies, with a focus on the latest applications of plasma atomic layer etching(PALE) in silicon-based materials, silicon nitride, silicon oxide, and transition metal compounds. Furthermore, in comparison to international developments, the review highlights challenges for domestic ALE technologies,including the need for breakthroughs in multi-material compatibility, process stability, and eco-friendly precursor development. Finally, the future development of ALE technique has been prospected, encompassing laser-plasma hybrid processes, machine learning-driven intelligent control, and low global warming potential gas alternatives,which provides theoretical support for the research and application of next-generation atomic-scale manufacturing technologies.
Design of Air-coupled Broadband CMUT Micro-elements and Array Configurations
LIU Yuantao;XU Gaobin;YANG Yucheng;SUN Baichuan;JI Xu;To address the issues of narrow bandwidth and low sensitivity in air-coupled CMUT operating in the mid-frequency range(200 kHz-2 MHz), this study proposes a high-sensitivity broadband CMUT element and array through element structure design and array configuration optimization. The element employs a composite structure combining annular electrodes with nickel convex rings to regulate diaphragm stiffness, enabling pistonmode vibration for enhanced sensitivity. The array adopts a novel hybrid heterogeneous-homogeneous planar configuration: lateral heterogeneous design(frequency band overlap of different elements) expands bandwidth,while longitudinal homogeneous design(output superposition of identical elements) boosts overall sensitivity,achieving synergistic optimization of both parameters. Parametric optimization and performance simulation using COMSOL software demonstrate that the proposed CMUT element achieves a receiving sensitivity of 21.00 μV·Pa-1/mm2 and a transmitting sensitivity of 1.05 kPa·V-1/mm2 at the central frequency of 1.00 MHz. The array design realizes 111.75%-6 dB fractional bandwidth and 230.15 nA peak output current within the midfrequency range. Finally, a CMUT fabrication process based on MEMS manufacturing technology has been established, delivering concrete experimental protocols for practical implementation.
Simulation of Electromagnetic Properties in Inductively Coupled Plasma
GUAN Yong;ZHANG Zhengquan;This study develops an electromagnetic model of inductively coupled plasma(ICP) to explore its electromagnetic transmission properties under varying discharge conditions, supporting plasma stealth technology.Plasma parameters are derived from hydrodynamic simulations to ensure model accuracy. Simulations of ICP's reflection and absorption spectra reveal that adjusting gas pressure, gas ratio, and power effectively controls attenuation bands and amplitudes, suppressing radar reflection signals. O-ICP absorbs strongly below 6 GHz, while Ar-ICP is more efficient at 6-14 GHz. Increasing pressure or power shifts absorption peaks to higher frequencies and broadens the absorption range. Additionally, ICP excited by anti-phase currents shows lower cutoff frequencies and weaker absorption than in-phase currents.
The Path Change of Micro-pitch Discharges at Different Air Pressure and Distance
WEI Xianrui;SUN Yanzhou;ZHANG Hao;MA Guokai;In order to investigate the effect of micro-pitch discharge initiation paths on conventional Paschen curves, gas discharge experiments were carried out on two different sets of electrodes with electrode distances in the range of 10 μm-100 μm and air pressures of 1 kPa-100 kPa, and simulated using COMSOL multi-physics field simulation software. The electric field strength and electron density of the plate-plate electrodes in the micro-gap are also numerically calculated for the approximate discharge paths. It was found that in the absence of an insulating layer at the edge of the electrodes, the ionization coefficient between the electrodes during the platform period decreases with the decrease in air pressure, making the number of collisional ionizations in the gap decrease, which leads to difficulties in meeting the self-sustained discharge requirements within the electrode distance. At this time,by changing the discharge path to make the electrode edge of a position meet the self-sustained discharge requirements, so that the breakdown voltage is maintained near the minimum value, and in the process of changing the path, the electron density distribution will be accompanied by the path change to the electrode edge. At the same time, it was found that when the electrode distance is fixed, the length to which the discharge requirements are met by extending the path will extend further toward the electrode edges as the air pressure decreases.
The Atmospheric Pressure Low-frequency Capacitive Coupling Ar/O2 Discharge Characteristics
LYU Mingyu;LIU Xiangmei;WANG Bo;LIN Jing;WANG Xin;In this paper, the one-dimensional fluid model is used to study the discharge characteristics of Ar/O2 plasma at low frequency(100 kHz). The effects of pressure and frequency on plasma density, ionization rate,electron temperature and ion energy bombarded to the upper plate are discussed. The results show that the γ mode dominates in the low-frequency Ar/O2 discharges, while the drift-ambipolar(DA) mode is relatively weak, but exhibits significant drift electric field and ambipolar field. Electrons are mainly concentrated at the upper electrode,and ion energy bombarded to the upper plate is much higher. With the increase of discharge frequency, the mode initially undergoes a transition, whereby it is first shifted from the γ/DA hybrid mode, which is predominantly governed by the γ mode, to the α/DA hybrid mode, which is predominantly governed by the DA mode, and then transitions into the α/DA hybrid mode dominated by the α mode. The mode transition has a significant effect on electron density, electron temperature and ion energy bombarded to the upper plate. When the pressure increases,the mode conversion phenomenon will also occur. However, the plasma density in the low frequency region and the high frequency region shows a completely different trend with the pressure. More importantly, as the pressure increases, the DA mode in the high frequency region is obviously enhanced, and the DA mode in the low frequency region is weakened.
News
Congratulations to the 16 editorial board members of the Journal of Vacuum Science and Technology for being selected as the "Global Top 2% Scientists"!
2024-01-04 TopCongratulations to the 7 editorial board members of the Journal of Vacuum Science and Technology for being selected as the 2022 Elsevier " Highly Cited Chinese Researchers"
2024-01-04 TopWarm congratulations
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211 National Societies of the China Association for Science and Technology jointly issued the Academic Publishing Ethics Convention
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