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Editor-in-chief

LIU Yichun

Academician of Chinese Academy of Sciences

Northeast Normal University

WeChat

WeChat official account

About the Journal

    Chinese Journal of Vacuum Science and Technology (CJVST) is national level scientific journal operated by the Chinese Vacuum Society and approved by the Chinese Association for Science and Technology. CJVST pressed the first volume in 1981. Since then, CJVST has been listed as a Chinese Science Citation Database (CSCD) journal and Chinse Core Journal. CJVST publishes Chinese and English research papers on vacuum acquisition, improvement, testing, and application, involving the intersection of physics, chemistry, engineering, materials, biology and other disciplines.

Issue 06,2026
综述评述

Research and Development of Static Expansion Vacuum Standards and Key Technologies

ZHANG Ruifang;CHENG Yongjun;SUN Wenjun;ZHAO Lan;DONG Meng;FENG Tianyou;CHEN Lian;

The static expansion vacuum standard, serving as the ultimate traceability reference for vacuum measurement values across nations, is widely adopted due to its simple principle and low uncertainty. As bottlenecks emerge in the deepening development of science and technology across various fields, demands for vacuum calibration traceability capabilities continue to rise. Consequently, countries persistently conduct experimental research on static expansion vacuum systems and their key technologies, enhancing vacuum measurement capabilities through continuous updates and iterations. This article reviews research progress on static expansion vacuum systems and their key technologies in over ten countries, including Germany, England, China,and Japan, while also outlining future development directions for static expansion vacuum systems.

Issue 06 ,2026 v.46 ;
[Downloads: 29 ] [Citations: 0 ] [Reads: 5 ] HTML PDF Cite this article
研究论文

Surface Defect Passivation Enables Efficient and Stable Perovskite Quantum Dot Light-emitting Diodes

BAI Yuting;YANG Zunxian;GUO Tailiang;

Perovskite quantum dots have garnered significant interest in light-emitting diode applications,attributed to their remarkable optoelectronic properties. However, during the purification process involving polar solvents, the detachment of ligands from the quantum dot surface often induces crystal defects and reduces luminescence performance. This paper uses a two-site quantum dot surface defect passivation strategy based on the ligand molecule N-PS to stabilize the dynamic surface. N-PS greatly reduces the surface defects of quantum dots through the strong anchoring of(CH2)_2N(CH3)+ and SO3~- functional groups. The electroluminescence performance of the corresponding quantum dot light-emitting diode is greatly improved, with the external quantum efficiency increased to 10.07% and the turn-on voltage reduced to 2.5 V. These QLEDs exhibit excellent optoelectronic properties, providing new insights into tuning the surface chemistry of perovskite quantum dots to achieve surface ligand design criteria for high-performance LEDs or other optoelectronic devices.

Issue 06 ,2026 v.46 ;
[Downloads: 261 ] [Citations: 0 ] [Reads: 5 ] HTML PDF Cite this article

Design of Novel Asymmetric Variable-clearance Spiral Tooth Profile and Experimental Investigation of Internal Flow Characteristics

LIAN Jiadi;ZHANG Zhihao;LUO Junhao;XU Jing;XIE Hangqing;PAN Wei;

Existing asymmetric vortex structures suffer from issues such as pressure imbalance in the working chamber and pressure fluctuations at the exhaust port. Against this backdrop, research on vortex vacuum pump profile lines was conducted. By applying composite profile lines from symmetric vortex profiles to asymmetric vortex profiles, a novel asymmetric vortex profile was constructed. An asymmetric arc modification method is proposed to resolve meshing challenges. The curve equation for an asymmetric variable-clearance scroll tooth profile is designed. To ensure efficient and stable operation of the scroll mechanism, the pressure imbalance between the two working chambers can be mitigated through a gradient-varying meshing clearance. The fundamental parameters of the asymmetric vortex vacuum pump were determined, the volumes and internal volume ratios of each chamber were calculated, and the variation patterns of the working chamber area were analyzed. Concurrently, the influence of the offset coefficient on backlash was examined to achieve performance optimization. This study employs a novel asymmetric profile design incorporating an offset coefficient j to form a variable clearance meshing structure, significantly improving the flow field performance within the vortex vacuum pump. Simulation results demonstrate that this design increases the compression chamber pressure balance ratio from 1: 0.767 to 1: 0.992.When j=0.2, the pressure pulsation rate decreases by 38.5%, and the flow pulsation rate decreases by 18.2%.Experimental validation demonstrates that under a 20 kPa pressure differential, the new pump achieves an average flow rate of 10.5 m3/h with a pressure pulsation range of only 0-1.9 kPa, outperforming conventional pumps and fully showcasing its advantages in suppressing pulsation and enhancing flow stability.

Issue 06 ,2026 v.46 ;
[Downloads: 78 ] [Citations: 0 ] [Reads: 5 ] HTML PDF Cite this article

Effects of Dynamic Adsorption–desorption on Residual Gas Noise in Space-borne Gravitational-wave Inertial Sensors

ZHANG Jun;WANG Peng;LI Donghui;WENG Lei;OUYANG Zhi;WANG Xudi;

Residual gas noise limits the measurement accuracy of space-borne inertial sensors and is critical for space-borne gravitational wave detection. The dominant residual gases are hydrogen and water molecules in inertial sensors during on-orbit operation. The evaluation of water-molecule-induced noise remains a major challenge. Water molecules exhibit long and widely distributed surface residence times on metal surfaces, ranging from 10-3 s to 105 s. This behavior prolongs the impulse intervals acting on the test mass and interferes with gravitational wave signals in the 0.1 mHz to 100 mHz range. This phenomenon is known as the dynamic adsorption–desorption effect. In this study, a theoretical model of residual gas noise induced by the dynamic adsorption–desorption of water molecules is developed, and its physical mechanism is analyzed. The results show that the residual gas noise induced by water molecules is 1.73 times that induced by hydrogen, and it may exceed the threshold of 1×10-15(m·s-2/Hz1/2). The dynamic adsorption–desorption effect is governed by the adsorption coefficient ka and the desorption coefficient kd. Adsorption coefficient ka reduces noise by buffering momentum transfer, while a higher desorption coefficient increases it. This study and its findings are significant for the spaceborne gravitational wave detectors.

Issue 06 ,2026 v.46 ;
[Downloads: 21 ] [Citations: 0 ] [Reads: 3 ] HTML PDF Cite this article

The Discharge Process of Sputter Ion Pumps Based on the PIC-MCC Method

LI Dong;ZHANG Hao;WANG Feng;ZHANG Yingzhi;YE Linlin;WANG Liang;ZHAO Chongling;YUAN Fang;

The pumping performance of sputtering ion pumps depends on a complex discharge process involving microscopic mechanisms such as particle collisions and gas ionization, which directly affects its ionization efficiency, pumping speed, and stability and lifespan at low pressures. Traditional experimental methods are costly and have strict conditions, while numerical simulation is efficient and controllable. Among them, the particle simulation method has become an important means to study the discharge process due to its high accuracy and applicability to non-equilibrium states. Existing research mostly focuses on macroscopic parameters and lacks indepth analysis of the microscopic motion of charged particles and the dynamic influence of electromagnetic fields.This paper adopts the particle-in-cell(PIC) method combined with the Monte Carlo collision(MCC) method, and through three-dimensional numerical simulation with VSim software, reveals the distribution and motion characteristics of electrons and ions under different pressures, magnetic fields, and voltages in high vacuum,clarifies the influence mechanism of these key parameters on particle transport, density distribution, and ion current,providing a theoretical basis for the subsequent precise calculation of sputtering yield and pumping speed optimization, and offering reliable technical support for pump performance improvement and structural optimization.

Issue 06 ,2026 v.46 ;
[Downloads: 21 ] [Citations: 0 ] [Reads: 3 ] HTML PDF Cite this article
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